发明名称 COPPER/ALUMINIUM ALLOY CRYSTAL OSCILLATION PLATE COATING PROCESS
摘要 A copper/aluminium alloy crystal oscillation plate alloy coating process. Magnetron sputtering technology is used to form an aluminium film and a copper film on a quartz substrate. A copper/aluminium alloy film formed on the quartz plate in the process is firmly combined with the quartz plate, and the compositional proportions of the copper and aluminium in the copper/aluminium alloy film can be accurately controlled.
申请公布号 WO2017020535(A1) 申请公布日期 2017.02.09
申请号 WO2016CN00422 申请日期 2016.08.01
申请人 ZHONGSHAN TAI WEI ELECTRONIC CO., LTD. 发明人 XIAO, Gonghe;CHEN, Yuanqin
分类号 C23C14/35;C23C14/18 主分类号 C23C14/35
代理机构 代理人
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