发明名称 |
COPPER/ALUMINIUM ALLOY CRYSTAL OSCILLATION PLATE COATING PROCESS |
摘要 |
A copper/aluminium alloy crystal oscillation plate alloy coating process. Magnetron sputtering technology is used to form an aluminium film and a copper film on a quartz substrate. A copper/aluminium alloy film formed on the quartz plate in the process is firmly combined with the quartz plate, and the compositional proportions of the copper and aluminium in the copper/aluminium alloy film can be accurately controlled. |
申请公布号 |
WO2017020535(A1) |
申请公布日期 |
2017.02.09 |
申请号 |
WO2016CN00422 |
申请日期 |
2016.08.01 |
申请人 |
ZHONGSHAN TAI WEI ELECTRONIC CO., LTD. |
发明人 |
XIAO, Gonghe;CHEN, Yuanqin |
分类号 |
C23C14/35;C23C14/18 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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