发明名称 PHOTOSENSITIVE RESIN COMPOSITION, LITHOGRAPHIC PRINTING ORIGINAL PLATE, AND METHOD FOR MANUFACTURING LITHOGRAPHIC PLATE
摘要 There is provided a photosensitive resin composition which enables production of a lithographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a lithographic printing plate having excellent printing durability, excellent chemical resistance, and, in particular, excellent printing durability at the time of using a low quality print material, a lithographic printing plate precursor obtained by using the photosensitive resin composition, and a method for producing a lithographic printing plate. The photosensitive resin composition contains a polymer compound having a linking group represented by Formula A-1 in the main chain; and an infrared absorbing material. In Formula A-1, R 1 and R 2 each independently represent a hydrogen atom or a monovalent organic group, and X 1 is a specific linking group.
申请公布号 EP3128367(A1) 申请公布日期 2017.02.08
申请号 EP20150772211 申请日期 2015.03.31
申请人 Fujifilm Corporation 发明人 MUKAIYAMA Rena;NOZAKI Atsuyasu;SATO Takashi;ASANO Kotaro
分类号 G03F7/004;B41C1/10;C08G18/18;C08G18/32;C08G18/38;C08G18/50;C08G18/72;C08G18/73;C08G18/75;C08G18/76;C08G18/80;C08G71/02;G03F7/00;G03F7/039;G03F7/09;G03F7/095;G03F7/20;G03F7/32 主分类号 G03F7/004
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