| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem of the presence of fundamental error occurrence factors, in a variably shaped electron-beam exposure system, such as occurrence of spreading of a beam orbit and out-of-focusing caused by Coulomb repulsion acting among electrons in an electron beam in proportion to a rectangularly shaped beam irradiation area and occurrence of dislocation of a beam convergent position, namely, pattern size deviation as a result.SOLUTION: Intermediate connection rectangle data 63 of a beam area substantially equal to that of rimming rectangles 64 having the same width W with a width of the rectangle data 63 are arranged so as to surround outer edges of internal rectangle data, thereby preventing the intermediate connection rectangles positioned in the vicinity of an outer edge of a pattern and a rimming rectangle pattern size from being deviated from designed dimensions and minute irregularity from being generated on a side surface of the pattern. |
