发明名称 加熱装置、基板処理装置及び半導体装置の製造方法
摘要 PROBLEM TO BE SOLVED: To improve in-plane temperature uniformity when processing a substrate by heating.SOLUTION: A heating device comprises: a plurality of lamp control parts; lamps connected to the lamp control parts, respectively; a power source for supplying power to the lamps through the lamp control parts; and a lamp arrangement part for arranging the lamps in a manner such that each lamp among the lamps lies adjacent to the lamp of the different lamp control part.
申请公布号 JP6077807(B2) 申请公布日期 2017.02.08
申请号 JP20120204589 申请日期 2012.09.18
申请人 株式会社日立国際電気 发明人 斉藤 択弥;天野 富大
分类号 H01L21/26 主分类号 H01L21/26
代理机构 代理人
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