发明名称 |
PLASMA TREATMENT DEVICE AND COIL USED THEREIN |
摘要 |
A plasma etching apparatus includes a chamber having a processing space and a plasma generating space 4 defined therein and a coil 20 wound around the processing chamber, the coil 20 has at least three inward projecting portions 21 formed thereon which project inward in a radial direction with respect to a pitch circle P defined outside a portion of the processing chamber 2 corresponding to the plasma generating space 4, and the at least three inward projecting portions 21 are arranged at equal intervals along a circumferential direction of the pitch circle P. |
申请公布号 |
EP3128819(A1) |
申请公布日期 |
2017.02.08 |
申请号 |
EP20140887912 |
申请日期 |
2014.03.31 |
申请人 |
SPP Technologies Co., Ltd. |
发明人 |
HAYAMI, Toshihiro;MIYAZAKI, Toshiya |
分类号 |
H05H1/46;H01L21/205;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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