プラズマ補助物理気相蒸着源,申请号JP20150555090-传众专利搜索

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发明名称	プラズマ補助物理気相蒸着源
摘要	The present invention relates to a physical vapour deposition source using plasma, and relates to a technique whereby plasma is combined with a thermal physical vapour deposition source for forming a thin film under high vacuum.
申请公布号	JP6078171(B2)	申请公布日期	2017.02.08
申请号	JP20150555090	申请日期	2013.12.04
申请人	コリアベーシックサイエンスインスティテュート	发明人	チョイヨンソプ;ジョンヨンホ;ノテヒョプ;ソクドンチャン;パクヒョンジェ
分类号	C23C14/24	主分类号	C23C14/24
代理机构		代理人
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