发明名称 半導体装置の作製方法
摘要 A method for manufacturing a transistor with stable electric characteristics and little signal delay due to wiring resistance, used in a semiconductor device including an oxide semiconductor film. A semiconductor device including the transistor is provided. A high-performance display device including the transistor is provided.
申请公布号 JP6077488(B2) 申请公布日期 2017.02.08
申请号 JP20140079871 申请日期 2014.04.09
申请人 株式会社半導体エネルギー研究所 发明人 山崎 舜平
分类号 H01L21/336;G02F1/1368;H01L21/28;H01L29/417;H01L29/786 主分类号 H01L21/336
代理机构 代理人
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