| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which effectively inhibits pressure rise in a recovery duct and prevents a gas and process liquids from jetting even when the multiple process liquids, which cause an exothermic reaction and generate the gas, are recovered being mixed.SOLUTION: An individual recovery duct 11a in a processing unit A and an individual recovery duct 11b in a processing unit B are connected by a common recovery duct 12. A drain of a process liquid discharged from the processing unit A and a drain of a process liquid discharged from the processing unit B are discharged to a drain part 10 through the recovery duct formed by the individual recovery ducts 11a, 11b and the common recovery duct 12. A pressure releasing duct 20 for discharging a gas occurring in the common recovery duct 12 to the exterior is connected with the common recovery duct 12. |
