| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for purifying a developing solution, which can suppress generation of a development defect in a resist pattern and improve a yield in manufacturing a semiconductor device.SOLUTION: A method for purifying a developing solution essentially comprising an organic solvent is provided, the developing solution to be used for forming a negative pattern by using a chemically amplified resist composition. The method for purifying a developing solution is carried out by using a filtration device having a filter (I) having a pore diameter of 0.05 μm or less, and by circulating the developing solution in the filtration device to pass through the filter (I) at least twice. |
