发明名称 |
PROCESS FOR MANUFACTURING RESIST COMPOSITION AND PATTERNING PROCESS |
摘要 |
This is to provide a process for manufacturing a resist composition which can prepare a resist composition lowered in coating defects, and
the manufacturing process is a process for manufacturing a resist composition to be used in a process for manufacturing a semiconductor apparatus, the process comprising the steps of:
cleaning a manufacturing apparatus for a resist composition with a cleaning solution;
analyzing the cleaning solution taken out from the manufacturing apparatus;
repeating the step of cleaning and the step of analyzing until a concentration of metal components contained in the cleaning solution becomes 5 ppb or less; and
manufacturing the resist composition by using the manufacturing apparatus after the step of repeating. |
申请公布号 |
EP2990871(B1) |
申请公布日期 |
2017.02.08 |
申请号 |
EP20150000794 |
申请日期 |
2015.03.17 |
申请人 |
Shin-Etsu Chemical Co., Ltd. |
发明人 |
Ogihara, Tsutomu;Iwabuchi, Motoaki |
分类号 |
G03F7/16 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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