发明名称 PROCESS FOR MANUFACTURING RESIST COMPOSITION AND PATTERNING PROCESS
摘要 This is to provide a process for manufacturing a resist composition which can prepare a resist composition lowered in coating defects, and the manufacturing process is a process for manufacturing a resist composition to be used in a process for manufacturing a semiconductor apparatus, the process comprising the steps of: cleaning a manufacturing apparatus for a resist composition with a cleaning solution; analyzing the cleaning solution taken out from the manufacturing apparatus; repeating the step of cleaning and the step of analyzing until a concentration of metal components contained in the cleaning solution becomes 5 ppb or less; and manufacturing the resist composition by using the manufacturing apparatus after the step of repeating.
申请公布号 EP2990871(B1) 申请公布日期 2017.02.08
申请号 EP20150000794 申请日期 2015.03.17
申请人 Shin-Etsu Chemical Co., Ltd. 发明人 Ogihara, Tsutomu;Iwabuchi, Motoaki
分类号 G03F7/16 主分类号 G03F7/16
代理机构 代理人
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