| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus which can hold a substrate temperature during film deposition to form a film of desired quality.SOLUTION: The film deposition apparatus is an inline type film deposition apparatus 1 that includes a plurality of film deposition chambers and forms a plurality of layers on a substrate, the apparatus at least including a first heat chamber 12 provided upstream from the plurality of film deposition chambers, and a second heat chamber 15 provided between the plurality of film deposition chambers. |
