发明名称 III族窒化物結晶及びその製造方法
摘要 PROBLEM TO BE SOLVED: To provide a group III nitride crystal suppressed in stacking fault.SOLUTION: The group III nitride crystal 100 includes a group III nitride semiconductor layer 102 formed on a seed crystal 101 which is composed of a group III nitride and the principal plane of which is a semipolar plane or a nonpolar plane where a ratio (&bgr;/α) of emission line density (&bgr;) in a plane parallel to the principal plane of the group III nitride semiconductor layer 102 to emission line density (α) in the principal plane of the seed crystal 101 is 10 or lower or |&bgr;-α| is 50 or lower.
申请公布号 JP6074959(B2) 申请公布日期 2017.02.08
申请号 JP20120197446 申请日期 2012.09.07
申请人 三菱化学株式会社 发明人 藤澤 英夫;三川 豊;鎌田 和典
分类号 C30B29/38;C01B21/06;C30B7/10 主分类号 C30B29/38
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