| 发明名称 | Photoresist composition, compound and process of producing photoresist pattern | ||
| 摘要 | A photoresist composition comprising: a resin having an acid-labile group,an acid generator, anda compound represented by formula (I):; wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group. | ||
| 申请公布号 | US9563123(B2) | 申请公布日期 | 2017.02.07 |
| 申请号 | US201514635718 | 申请日期 | 2015.03.02 |
| 申请人 | SUMITOMO CHEMICAL COMPANY, LIMITED | 发明人 | Masuyama Tatsuro;Fujita Shingo;Ichikawa Koji |
| 分类号 | G03F7/004;G03F7/039;G03F7/38;C07D321/10;C07C71/00 | 主分类号 | G03F7/004 |
| 代理机构 | Birch, Stewart, Kolasch & Birch, LLP | 代理人 | Birch, Stewart, Kolasch & Birch, LLP |
| 主权项 | 1. A photoresist composition comprising: a resin having an acid-labile group, an-acid-generator, and a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group. | ||
| 地址 | Tokyo JP | ||