发明名称 Semiconductor laser device
摘要 A semiconductor laser device capable of high output is provided. A semiconductor laser diode includes: a substrate; and a semiconductor stacked structure, which is formed on the substrate through crystal growth. The semiconductor stacked structure includes: an n-type (Alx1Ga(1-x1))0.51In0.49P cladding layer and a p-type (Alx1Ga(1-x1))0.51In0.49P cladding layer; an n-side Alx2Ga(1-x2)As guiding layer and a p-side Alx2Ga(1-x2)As guiding layer, which are sandwiched between the cladding layers; and an active layer, which is sandwiched between the guiding layers. The active layer is formed of a quantum well layer including an AlyGa(1-y)As(1-x3)Px3 layer and a barrier layer including an Alx4Ga(1-x4)As layer that are alternatively repetitively stacked for a plurality of periods.
申请公布号 US9564739(B2) 申请公布日期 2017.02.07
申请号 US201615048996 申请日期 2016.02.19
申请人 ROHM CO., LTD 发明人 Noma Tsuguki;Akutsu Minoru;Nishioka Yoshito
分类号 H01S5/00;H01S5/343;B82Y20/00;H01S5/20;H01S5/32;H01S5/22;H01S5/34 主分类号 H01S5/00
代理机构 Rabin & Berdo, P.C. 代理人 Rabin & Berdo, P.C.
主权项 1. A semiconductor laser device, comprising: a p-type cladding layer and an n-type cladding layer; a p-side guiding layer and an n-side guiding layer between the p-type cladding layer and the n-type cladding layer, including an arsenic group compound semiconductor, and having bandgaps narrower than those of the p-type cladding layer and the n-type cladding layer; and an active layer between the p-side guiding layer and the n-side guiding layer, including at least one quantum well layer; the p-type cladding layer and the n-type cladding layer include an AlGaInP layer or a GaInP layer respectively; the quantum well layer includes an AlGaAsP layer.
地址 Kyoto JP
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