| 发明名称 | Lithographic apparatus and device manufacturing method | ||
| 摘要 | A lithographic projection apparatus includes a laser cleaning device. The laser cleaning device is constructed and arranged to clean a surface. The laser cleaning device includes a laser source constructed and arranged to generate radiation, and an optical element constructed and arranged to focus the radiation in a focal point in order to generate a cleaning plasma in a background gas above the surface. The laser cleaning device is further provided with a gas supply constructed and arranged to generate a jet of protection gas at a location near the plasma. | ||
| 申请公布号 | US9563137(B2) | 申请公布日期 | 2017.02.07 |
| 申请号 | US201013378928 | 申请日期 | 2010.05.20 |
| 申请人 | ASML NETHERLANDS B.V. | 发明人 | Lammers Nicolaas Arnoldus;Scaccabarozzi Luigi |
| 分类号 | G03B27/42;G03F7/20;B08B5/02;B08B7/00;H01L21/02 | 主分类号 | G03B27/42 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A laser cleaning device constructed and arranged to clean a surface, the laser cleaning device comprising: a laser source constructed and arranged to generate radiation; a first gas supply constructed and arranged to generate a background gas; an optical element constructed and arranged to focus the radiation in a focal point above the surface in order to generate a cleaning plasma in the background gas above the surface; and a second gas supply constructed and arranged to separately generate a jet of protection gas at a location near the plasma to avoid damage to the surface, wherein the protection gas is provided in another direction, different from a direction of the radiation. | ||
| 地址 | Veldhoven NL | ||