发明名称 |
Doping an absorber layer of a photovoltaic device via diffusion from a window layer |
摘要 |
Methods for doping an absorbent layer of a p-n heterojunction in a thin film photovoltaic device are provided. The method can include depositing a window layer on a transparent substrate, where the window layer includes at least one dopant (e.g., copper). A p-n heterojunction can be formed on the window layer, with the p-n heterojunction including a photovoltaic material (e.g., cadmium telluride) in an absorber layer. The dopant can then be diffused from the window layer into the absorber layer (e.g., via annealing). |
申请公布号 |
US9564543(B2) |
申请公布日期 |
2017.02.07 |
申请号 |
US201414546697 |
申请日期 |
2014.11.18 |
申请人 |
First Solar, Inc. |
发明人 |
Feldman-Peabody Scott Daniel;Gossman Robert Dwayne |
分类号 |
H01L31/0296;H01L31/18;H01L31/073 |
主分类号 |
H01L31/0296 |
代理机构 |
MacMillan, Sobanski & Todd, LLC |
代理人 |
MacMillan, Sobanski & Todd, LLC |
主权项 |
1. A method of doping an absorbent layer in a thin film photovoltaic device, the method comprising:
depositing a window layer on a transparent substrate, wherein the window layer comprises a dopant; forming a p-n heterojunction on the window layer such that the window layer is positioned between the p-n heterojunction and the transparent substrate, wherein the p-n heterojunction comprises an absorber layer, and wherein the absorber layer comprises a photovoltaic material; diffusing the dopant from the window layer into the absorber layer; and forming a back contact layer directly on the absorber layer. |
地址 |
Tempe AZ US |