Hardmask

摘要

This invention provides a composition containing an organometallic compound having a chromophore moiety in the metal polymer backbone which allows a wider range of n/k values such that substrate reflectivity can be controlled under various conditions.

主权项

1. A method comprising: providing a substrate; coating a film of the composition comprising: an organometallic compound of the formulawherein R2═(C1-C20)hydrocarbyl; M1 is a Group 3 to Group 14 metal; G=R3b-Ch-R3b or Ch(OM1L1mOR2)c; Ch=a chromophore moiety; R3 is a divalent linking group having from 1 to 12 carbon atoms; R4═H, R2 or M(L1)mOR2; L1 is a ligand; m refers to the number of ligands and is an integer from 1-4; a=an integer from 1 to 20; each b is independently an integer from 0 to 25; c=1 or 2; and an organic solvent on a surface of the substrate; curing the film under conditions sufficient to form a metal hardmask layer comprising the chromophore moiety; disposing a layer of a photoresist on the cured metal hardmask layer; and exposing the photoresist by to patterned radiation to form an image.