发明名称 Intermediate film for laminated glasses, and laminated glass
摘要 The present invention provides an intermediate film for laminated glass that can increase the heat-insulating properties of laminated glass. The intermediate film for laminated glass according to the present invention is an intermediate film for laminated glass having a one-layer structure or a laminated structure of two or more layers, an intermediate film 1 for laminated glass has a first layer 2 containing silicon dioxide particles 51 having hollow parts and shell parts and having a porosity of 40% or more and 80% or less, when the intermediate film 1 for laminated glass has a one-layer structure, the first layer further contains a thermoplastic resin, and when the intermediate film 1 for laminated glass has a laminated structure of two or more layers, the intermediate film 1 for laminated glass further has a second layer 3 which is arranged on a first surface 2a side of the first layer 2 and which contains a thermoplastic resin.
申请公布号 US9561639(B2) 申请公布日期 2017.02.07
申请号 US201113882983 申请日期 2011.11.09
申请人 SEKISUI CHEMICAL CO., LTD.;GRANDEX CO., LTD.;NAGOYA INSTITUTE OF TECHNOLOGY 发明人 Fukatani Juichi;Ii Daizou;Yoshioka Tadahiko;Fuji Masayoshi;Fujimoto Kyoichi;Takai Chika;Hayashi Kozo
分类号 B32B27/30;B32B3/26;B32B17/10;C08K3/36 主分类号 B32B27/30
代理机构 Cheng Law Group, PLLC 代理人 Cheng Law Group, PLLC
主权项 1. An intermediate film for laminated glass which is a multilayer intermediate film for laminated glass having a laminated structure of two or more layers, comprising: a first layer which contains silicon dioxide particles having hollow parts and shell parts and having a porosity of 40% or more and 80% or less, which further contains a polyvinyl butyral resin or an acrylic urethane resin as a binder resin, and which has a thickness in μm of 0.005 T or more and 0.6 T or less when the thickness in μm of the intermediate film for laminated glass is defined as T, wherein a product of the content of the silicon dioxide particles in the first layer in % by weight×0.01 and the thickness in μm of the first layer is 0.1 or more and 60 or less, and wherein the first layer contains the silicon dioxide particles in an amount of 0.1 g/m2 or more and 80 g/m2 or less, and a second layer which is arranged on a first surface side of the first layer and which contains a thermoplastic resin.
地址 Osaka JP