| 发明名称 | Compound, resin, resist composition and method for producing resist pattern | ||
| 摘要 | A resist composition has a resin (A1) including a structural unit having an acid-labile group, a resin (A2) including a structural unit having a group represented by formula (Ia), and an acid generator.;wherein R1 in each occurrence independently represents a fluorine atom or a C1 to C6 fluorinated alkyl group, ring W represents a C5 to C18 alicyclic hydrocarbon group, n represents an integer of 1 to 6, and * represents a binding site. | ||
| 申请公布号 | US9562122(B2) | 申请公布日期 | 2017.02.07 |
| 申请号 | US201514835054 | 申请日期 | 2015.08.25 |
| 申请人 | SUMITOMO CHEMICAL COMPANY, LIMITED | 发明人 | Masuyama Tatsuro;Yamamoto Satoshi;Ichikawa Koji |
| 分类号 | G03F7/004;G03F7/38;C07C69/653;C07C69/74;C08F220/22;C08F220/24;C08F120/22;C07C233/14;C08F220/18;G03F7/039 | 主分类号 | G03F7/004 |
| 代理机构 | Birch, Stewart, Kolasch & Birch, LLP | 代理人 | Birch, Stewart, Kolasch & Birch, LLP |
| 主权项 | 1. A resist composition comprising a resin (A1) which comprises a structural unit having an acid-labile group, a resin (A2) which comprises a structural unit having a group represented by formula (Ia) and having no acid-labile group, and an acid generator: wherein R1 in each occurrence independently represents a fluorine atom or a C1 to C6 fluorinated alkyl group, ring W represents a C5 to C18 alicyclic hydrocarbon group, n represents an integer of 1 to 6, and * represents a binding site. | ||
| 地址 | Tokyo JP | ||