| 摘要 |
The present invention is a compound represented by general formula (A), a base and/or radical generator obtained by containing said compound, and the like. (In the formula: four R1 groups each independently represents a hydrogen atom or a fluorine atom; four R2 groups each independently represents a fluorine atom or a trifluoromethyl group; R3, R6, R7, and R10 each independently represents a hydrogen atom or a C1-12 alkyl group; R4 and R5 each independently represents a hydrogen atom or a C1-12 alkyl group, or R4 and R5 are bonded to each other to represent a C2-4 alkylene group; R8 and R9 each independently represents a hydrogen group, a C1-12 alkyl group, or a C6-14 aryl group which may have a substituent such as a C1-6 alkyl group, or R8 and R9 are bonded to each other to represent a C2-4 alkylene group, with the caveat that two to three of the eight R3-R8 groups are hydrogen atoms, three to six of the remaining groups are alkyl groups if two of the eight groups are hydrogen atoms, and four to five of the remaining groups are alkyl groups if three of the eight groups are hydrogen atoms). |
