发明名称 DISPLACEMENT SENSOR, METHOD OF USE AND MANUFACTURE THEREOF, AND INTERFEROMETER
摘要 Provided is a displacement sensor, comprising: a semiconductor laser (101) for generating a laser beam; a diffraction grating (102) for directly diffracting and then reflecting a portion of light in the laser beam to generate a first diffracted light, and for diffracting a portion of light in the laser beam passing through the diffraction grating, reaching an object to be measured, and passing through the diffraction grating again after being reflected by the object, so as to form a second diffracted light; a detector (103), located at an intersection of diffracted lights having a preset same order in the first diffracted light and the second diffracted light to be measured, and being for measuring an interference intensity information variation between the diffracted lights; and an information processor (104), connected to the detector (103), and being for reading an interference intensity signal, and for inverting, according to the interference intensity variation information measured by the detector (103), displacement information of the object, wherein the diffraction grating (102) is located between the semiconductor laser (101) and the object. Further disclosed are methods of use and manufacture of the displacement sensor, and an interferometer.
申请公布号 WO2017016144(A1) 申请公布日期 2017.02.02
申请号 WO2015CN97620 申请日期 2015.12.16
申请人 SUZHOU INSTITUTE OF NANO-TECH AND NANO-BIONICS (SINANO), CHINESE ACADEMY OF SCIENCES 发明人 SUN, Tianyu;ZHANG, Baoshun
分类号 G01B11/00;G01D5/38;G01P13/00 主分类号 G01B11/00
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