| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. |
| 申请公布号 |
US2017031250(A1) |
申请公布日期 |
2017.02.02 |
| 申请号 |
US201615293009 |
申请日期 |
2016.10.13 |
| 申请人 |
ASML NETHERLANDS B.V. ;ASML HOLDING N.V. |
发明人 |
KEMPER Nicolaas Rudolf;COX Henrikus Herman Marie;DONDERS Sjoerd Nicolaas Lambertus;DE GRAAF Roelof Frederik;HOOGENDAM Christiaan Alexander;TEN KATE Nicolaas;Maria MERTENS Jeroen Johannes Sophia;VAN DER MEULEN Frits;Maria TEUNISSEN Franciscus Johannes Herman;VAN DER TOORN Jan-Gerard Cornelis;VERHAGEN Martinus Cornelis Maria;BELFROID Stefan Philip Christiaan;SMEULERS Johannes Petrus Maria;VOGEL Herman |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
Veldhoven NL |
