发明名称 Ag ALLOY FILM AND METHOD FOR PRODUCING SAME, Ag ALLOY SPUTTERING TARGET AND LAMINATED FILM
摘要 This Ag alloy film contains: 0.1 to 5.0 at% of Ti; at least one element selected from Cu, Sn, Mg, In, Sb, Al, Zn, Ge, and Ga in a total amount of at least 0.1 at% such that the combined total amount with the Ti is within a range that is no greater than 10.0 at%; and Ag and inevitable impurities as the balance. The total content of Na, Si, V, Cr, Fe, and Co is 100 ppm by mass or less.
申请公布号 WO2017018310(A1) 申请公布日期 2017.02.02
申请号 WO2016JP71375 申请日期 2016.07.21
申请人 MITSUBISHI MATERIALS CORPORATION 发明人 TOSHIMORI Yuto;SHIONO Ichiro;ZHANG Shoubin
分类号 C22C5/06;C22C5/08;C22F1/00;C22F1/14;C23C14/34 主分类号 C22C5/06
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