ELECTROSTATIC DISCHARGE PROTECTION DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

An ESD protection device includes an insulative substrate, first and second discharge electrodes contacting the insulative substrate, the first and second discharge electrodes being spaced apart from and opposed to each other, first and second outer electrodes provided on an outside surface of the insulative substrate and electrically connected to the first and second discharge electrodes, respectively; and a discharge auxiliary electrode extending from the first discharge electrode to the second discharge electrode in a region where the first and second discharge electrodes oppose each other. The discharge auxiliary electrode includes semiconductor particles and metal particles having an average particle diameter of about 0.3 μm to about 1.5 μm, and a density of the metal particles at a random cross-section of the discharge auxiliary electrode is greater than or equal to about 20 particles/50 μm2.

主权项

1. An electrostatic discharge protection device comprising:
an insulative substrate; first and second discharge electrodes disposed in contact with the insulative substrate, the first and second discharge electrodes being disposed spaced apart from and opposed to each other; first and second outer electrodes provided on an outside surface of the insulative substrate, the first outer electrode being electrically connected to the first discharge electrode, and the second outer electrode being electrically connected to the second discharge electrode; and a discharge auxiliary electrode extending from the first discharge electrode to the second discharge electrode in a region where the first and second discharge electrodes oppose each other; wherein the discharge auxiliary electrode includes at least semiconductor particles and metal particles, with an average particle diameter of the metal particles being about 0.3 μm to 1.5 μm and a density of the metal particles at a random cross-section of the discharge auxiliary electrode being greater than or equal to about 20 particles/50 μm2.