| 摘要 |
A maskless photolithoghrapic system in a cooperative working mode for a cross-scale structure, comprising: a laser point-by-point scanning exposure unit, a plane-projection exposure unit, a mobile station (19) and a calculation control unit (20), wherein the calculation control unit (20) decomposes a graph to be exposed, so that a graph with a precision requirement below a pre-determined threshold is exposed by the laser point-by-point scanning exposure unit, and a graph with a precision requirement greater than the pre-determined threshold is exposed by the plane-projection exposure unit; when conducting laser point-by-point scanning exposure on a sample on the mobile station (19), the light emitted by the laser point-by-point scanning exposure unit moves relative to the sample according to the graph with a precision requirement below the pre-determined threshold, thereby realizing the laser point-by-point scanning exposure of the sample; and when conducting plane-projection exposure on the sample, the plane-projection exposure unit emits light with a corresponding graph shape onto the sample according to the graph with a precision requirement greater than the pre-determined threshold, thereby realizing the plane-projection exposure of the sample. |
