VAPOR DEPOSITION SOURCE, VAPOR DEPOSITION APPARATUS AND METHOD FOR PRODUCING VAPOR-DEPOSITED FILM

摘要

Provided is a line source that enables high utilization efficiency of a vapor deposition material, while maintaining a uniform film formation distribution. This line source (10) is provided with slit nozzles (1), each having a length/width ratio from 4 to 50. The width of each slit nozzle (1) is from 1 mm to 5 mm, and the depth of each slit nozzle (1) is from 5 mm to 20 mm.