| 摘要 |
PROBLEM TO BE SOLVED: To prevent a particle or the like attached on a substrate support part from being attached again on the substrate.SOLUTION: In a substrate processing system, a substrate processing method, and a substrate processing program for processing a substrate with a processing liquid, cleaning processing of the substrate is performed by discharging the processing liquid from a processing liquid discharge nozzle toward the substrate while the substrate is rotated when the outer peripheral edge of the substrate is supported by a substrate support part provided on a rotation plate, or cleaning processing of the substrate support part is performed by moving the processing liquid discharge nozzle above the substrate support part and discharging the processing liquid from the processing liquid discharge nozzle toward the substrate support part in different conditions from the cleaning processing of the substrate when the substrate is not supported by the substrate support part. |
