发明名称 温度応答性細胞培養器材、及びその製造方法
摘要 A substrate having a pattern of two or more materials exhibiting different grafting efficiencies for a temperature-responsive polymer that varies its interaction with water in a temperature range of 0 to 80°C by electron beam irradiation under the same conditions is grafted with the temperature-responsive polymer by simultaneously irradiating the surfaces of the materials with electron beams to obtain a temperature-responsive cell culture substrate. According to this method, a temperature-responsive cell culture substrate having a surface (1) that allows cells to adhere thereto and to grow thereon during cell culturing and that allows the adhering and grown cells to be detached therefrom by changing the culturing temperature and a surface (2) that does not allow the cells to adhere thereto at all can be obtained by a simple process.
申请公布号 JP6069384(B2) 申请公布日期 2017.02.01
申请号 JP20150037082 申请日期 2015.02.26
申请人 株式会社セルシード 发明人 水谷 学;渡邊 広也;北野 百合子
分类号 C12M3/00;C12M1/00 主分类号 C12M3/00
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