发明名称 SiC単結晶の製造方法
摘要 PROBLEM TO BE SOLVED: To provide a method for making an SiC single crystal having little threading edge dislocation, and the SiC single crystal.SOLUTION: The method for making an SiC single crystal having little threading edge dislocation is provided which uses 4H-SiC or 6H-SiC as an SiC seed crystal, and which includes growing an SiC single crystal on the (0001) plane and developing a step in at least one direction selected from among (1) to (3) described below and on a threading edge dislocation: (1); a direction at an intersection angle of -30° or more and less than +30° to the [-1-120] orientation or a direction at an intersection angle of -30° or more and less than +30° with respect to the [11-20] orientation, (2); a direction at an intersection angle of -30° or more and less than +30° to the [-2110] orientation or a direction at an intersection angle of -30° or more and less than +30° to the [2-1-10] orientation, and (3); a direction at an intersection angle of -30° or more and less than +30° to the [-12-10] orientation or a direction at an intersection angle of -30° or more and less than +30° to the [1-210] orientation.
申请公布号 JP6069757(B2) 申请公布日期 2017.02.01
申请号 JP20120185974 申请日期 2012.08.26
申请人 国立大学法人名古屋大学 发明人 宇治原 徹;原田 俊太;関 和明
分类号 C30B29/36;C30B19/12 主分类号 C30B29/36
代理机构 代理人
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