| 摘要 |
PROBLEM TO BE SOLVED: To provide a mounting table for plasma processing of a processed substrate including a focus ring in which cracks due to thermal stress are less likely to occur.SOLUTION: A mounting table 100 comprises an electrostatic chuck 2 on which a processed substrate S subjected to plasma processing is mounted and a focus ring 1 installed on the electrostatic chuck so as to surround the site on which the processed substrate of the electrostatic chuck is mounted. The electrostatic chuck comprises a metallic electrostatic chuck body 21 and a dielectric layer 22 formed on an upper surface of the site 211 on which the processed substrate of the electrostatic chuck body is mounted. The capacitance of the focus ring is not more than a composite capacitance which is the sum of the capacitance of the processed substrate and the capacitance of the dielectric layer. A gap is provided between a lower surface 1A of the focus ring and an upper surface of the electrostatic chuck body facing the lower surface. |
