发明名称 Semiconductor light emitting device, nitride semiconductor layer, and method for forming nitride semiconductor layer
摘要 According to an embodiment, a semiconductor light emitting device (110, 111, 112) includes a foundation layer (60), a first semiconductor layer (10), a light emitting layer (30), and a second semiconductor layer (20). The foundation layer (60) has an unevenness (61) having recesses (61d), side portions (61 s), and protrusions (61p). A first major surface (60a) of the foundation (60) layer has an overlay-region. The foundation layer (60) has a plurality of dislocations (65) including first dislocations whose one ends reaching the recess (61d) and second dislocations whose one ends reaching the protrusion (61 p). A proportion of a number of the second dislocations reaching the first major surface (60a) to a number of all of the second dislocations is smaller than a proportion of a number of the first dislocations reaching the first major surface (60a) to a number of all of the first dislocations. A number of the dislocations (65) reaching the overlay-region of the first major surface (60a) is smaller than a number of all of the first dislocations.
申请公布号 EP2528115(B1) 申请公布日期 2017.02.01
申请号 EP20120157376 申请日期 2012.02.28
申请人 Kabushiki Kaisha Toshiba 发明人 Hikosaka, Toshiki;Harada, Yoshiyuki;Sugai, Maki;Nunoue, Shinya
分类号 H01L33/20;H01L33/12;H01L33/32 主分类号 H01L33/20
代理机构 代理人
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