发明名称 |
Semiconductor light emitting device, nitride semiconductor layer, and method for forming nitride semiconductor layer |
摘要 |
According to an embodiment, a semiconductor light emitting device (110, 111, 112) includes a foundation layer (60), a first semiconductor layer (10), a light emitting layer (30), and a second semiconductor layer (20). The foundation layer (60) has an unevenness (61) having recesses (61d), side portions (61 s), and protrusions (61p). A first major surface (60a) of the foundation (60) layer has an overlay-region. The foundation layer (60) has a plurality of dislocations (65) including first dislocations whose one ends reaching the recess (61d) and second dislocations whose one ends reaching the protrusion (61 p). A proportion of a number of the second dislocations reaching the first major surface (60a) to a number of all of the second dislocations is smaller than a proportion of a number of the first dislocations reaching the first major surface (60a) to a number of all of the first dislocations. A number of the dislocations (65) reaching the overlay-region of the first major surface (60a) is smaller than a number of all of the first dislocations. |
申请公布号 |
EP2528115(B1) |
申请公布日期 |
2017.02.01 |
申请号 |
EP20120157376 |
申请日期 |
2012.02.28 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Hikosaka, Toshiki;Harada, Yoshiyuki;Sugai, Maki;Nunoue, Shinya |
分类号 |
H01L33/20;H01L33/12;H01L33/32 |
主分类号 |
H01L33/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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