发明名称 自己組織化膜の下層膜形成組成物
摘要 There is a provided an underlayer film-forming composition which is used for an underlayer for a self-assembled film. An underlayer film-forming composition for self-assembled films, comprising a polysiloxane and a solvent. The polysiloxane may be a hydrolysis-condensation product of a silane containing a phenyl group-containing silane, or a hydrolysis-condensation product of a silane containing a silane of Formula (1) [R 2 Si(R 1 ) 3 (1)] wherein R 1 is an alkoxy group, an acyloxy group, or a halogen atom, and R 2 is an organic group containing a benzene ring optionally having a substituent and is a group bonded to the silicon atom through a Si-C bond, in a ratio of 10 to 100% by mol relative to the total silane, or a hydrolysis-condensation product of silanes containing the silane of Formula (1), a silane of Formula (2) [R 4 Si(R 3 ) 3 (2)], and a silane of Formula (3) [Si(R 5 ) 4 (3)] in a ratio of the silane of Formula (1):the silane of Formula (2):the silane of Formula (3) of 10 to 100:0 to 90:0 to 50 in terms of % by mol relative to the total silane:
申请公布号 JP6070964(B2) 申请公布日期 2017.02.01
申请号 JP20140507827 申请日期 2013.03.22
申请人 日産化学工業株式会社 发明人 若山 浩之;中島 誠;坂本 力丸
分类号 C09D183/04;B05D7/24;C09D5/00;C09D7/12;C09D153/00;C09D153/02;C09D183/06;C09D183/07 主分类号 C09D183/04
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