| 摘要 |
A light exposure device for light exposure treatment of a substrate (P) is provided with: a fine stage that has a substrate holder (PH) for holding part of the substrate (P) in a state assuring flatness and moves relative to a light exposure position (light exposure region (IA)) in the direction of the X-axis; and a substrate Y step feed device (88) that drives the substrate (P) in the direction of the Y-axis in an XY plane. In this instance, X-axis direction movement relative to the light exposure region (IA) by the fine stage holding part of the substrate (P) with the substrate holder (PH) in a state that assures flatness is carried out before and after movement of the substrate (P) in the Y-axis direction by the substrate Y step feed device (88), whereby a plurality of regions on the substrate (P) are light exposure treated. |
