| 摘要 |
PROBLEM TO BE SOLVED: To suppress occurrence of a defect in a pattern region to be transferred.SOLUTION: A nano-imprint template according to the present invention includes a substrate, an uneven pattern to be transferred that is located on a first side of the substrate, a recess that is located on a second side opposite to the first side of the substrate, and further includes a first region that is defined by the recess, a second region the thickness of which is larger than the thickness of the first region and that exists around the first region, and a pattern region that is a part of the first region and includes the desired uneven pattern, and a maximum flexure portion that is a portion that is flexed most when the first region is flexed toward the first side is outside the pattern region. |
