Thermal treatment device for display apparatus and thermal treatment method using the same

摘要

A thermal treatment method for a display apparatus includes providing an acceptor substrate on a substrate stage, providing on the acceptor substrate a pattern mask including a transfer layer, irradiating a flash light beam onto the pattern mask from a plurality of flash lamps, and transferring the transfer layer to the acceptor substrate. The plurality of flash lamps are symmetrically provided with respect to the acceptor substrate and are configured to irradiate flash light beams.

主权项

1. A thermal treatment method for a display apparatus, the thermal treatment method comprising:
providing an acceptor substrate on a substrate stage; providing on the acceptor substrate a pattern mask including a transfer layer; sequentially irradiating a plurality of flash light beams onto the pattern mask from a plurality of flash lamps, wherein, while one of the plurality of flash lamps irradiates a flash light beam, at least one other flash lamp of the plurality of flash lamps performs charging; and transferring the transfer layer to the acceptor substrate, wherein the plurality of flash lamps are symmetrically provided with respect to the acceptor substrate and are configured to irradiate flash light beams.