| 摘要 |
A compound of general formula (I): in which X represents O, S, NH or an N-alkyl radical, R1 and R2, identical or different, each represent H or a C1-C10 hydrocarbon radical, R1 and R2 not both representing H, R3 represents a C1-C10 hydrocarbon radical, and R represents a phenyl radical monosubstituted or disubstituted by a substituent Y and, if applicable, a substituent Z, chosen from Cl, Br, I and CF3, or R represents a C═R4(R5) radical in which R4 represents an hydrocarbon radical and R5 represents a linear or branched, saturated or unsaturated, hydrocarbon radical, optionally substituted, a COR6 group or a CO2R6 group, where R6 represents a hydrogen atom or a linear or branched, saturated or unsaturated, hydrocarbon radical. This compound can be used for the treatment of higher plants for controlling their growth and architecture. |
