发明名称 |
Touch panel and method for fabricating the same |
摘要 |
The present disclosure provides a touch panel, including: a cover lens, an optical compensation layer and a sensing electrode layer disposed between the cover lens and the optical compensation layer, wherein an etching region and a non-etching region are defined in the sensing electrode layer; an optical match is formed by the optical compensation layer with the sensing electrode layer, wherein the optical compensation layer receives incident light through the cover lens and the sensing electrode to reconcile the hue of the reflected light correspondingly formed from the etching region and the non-etching region. The present disclosure also provides a method for fabricating a touch panel. |
申请公布号 |
US9557863(B2) |
申请公布日期 |
2017.01.31 |
申请号 |
US201414256987 |
申请日期 |
2014.04.20 |
申请人 |
TPK Touch Solutions (Xiamen) Inc. |
发明人 |
Hsu I-Chung;Zhang Chunyong;Yang Lichun;Hsu Kuo-Shu;Shih Yuan-Jen |
分类号 |
G06F3/041;G06F3/044 |
主分类号 |
G06F3/041 |
代理机构 |
Cooper Legal Group, LLC |
代理人 |
Cooper Legal Group, LLC |
主权项 |
1. A touch panel, comprising:
a cover lens; an optical compensation layer; and a sensing electrode layer between the cover lens and the optical compensation layer, wherein:
an etching region and a non-etching region are defined in the sensing electrode layer,a first portion of a first surface of the sensing electrode layer contacts a first surface of a shielding element,a second portion of the first surface of the sensing electrode layer contacts a first surface of the optical compensation layer,a second surface of the optical compensation layer contacts a second surface of the shielding element,a third surface of the optical compensation layer contacts a third surface of the shielding element,an optical match is formed by the optical compensation layer with the sensing electrode layer, andthe optical compensation layer is configured to receive incident light through the cover lens and the sensing electrode layer to reconcile a hue of reflected light correspondingly formed from the etching region and the non-etching region. |
地址 |
Xiamen CN |