发明名称 Silicon carbide semiconductor device
摘要 A silicon carbide semiconductor device includes a silicon carbide layer, an insulating layer, a Schottky electrode, and a reaction region. The silicon carbide layer includes a p type region in contact with a first main surface and an n type region in contact with the p type region and the first main surface. The insulating layer has a third main surface, a fourth main surface, and a side wall surface connecting the third main surface and the fourth main surface, and is in contact with the first main surface at the fourth main surface. The Schottky electrode is in contact with the first main surface and the side wall surface. The reaction region is in contact with the insulating layer, the Schottky electrode, and the p type region. The reaction region contains an element constituting the Schottky electrode, an element constituting the insulating layer, silicon, and carbon.
申请公布号 US9559217(B2) 申请公布日期 2017.01.31
申请号 US201414892163 申请日期 2014.04.02
申请人 Sumitomo Electric Industries, Ltd. 发明人 Wada Keiji;Kanbara Kenji
分类号 H01L29/87;H01L29/872;H01L29/36;H01L29/06;H01L29/16;H01L21/04;H01L29/66;H01L29/47 主分类号 H01L29/87
代理机构 Venable LLP 代理人 Venable LLP ;Sartori Michael A.;Riggs Frank B.
主权项 1. A silicon carbide semiconductor device, comprising a silicon carbide layer which has a first main surface and a second main surface opposite to said first main surface, and includes a p type region in contact with said first main surface and an n type region in contact with said p type region and said first main surface; an insulating layer which has a third main surface, a fourth main surface opposite to said third main surface, and a side wall surface connecting said third main surface and said fourth main surface, said insulating layer being in contact with said first main surface at said fourth main surface; a Schottky electrode which is in contact with said first main surface and said side wall surface; and a reaction region which is in contact with said insulating layer, said Schottky electrode, and said p type region, wherein said reaction region contains an element constituting said Schottky electrode, an element constituting said insulating layer, silicon, and carbon, and wherein all of said side wall surface and a portion of said third main surface are covered by a continuous portion of said Schottky electrode.
地址 Osaka-shi JP