| 主权项 |
1. An electrophotographic photosensitive member to be negatively electrified, comprising:
a conductive substrate; a photoconductive layer on the conductive substrate, the photoconductive layer being formed from hydrogenated amorphous silicon; and a surface layer on the photoconductive layer, the surface layer being formed from hydrogenated amorphous silicon carbide, wherein the surface layer has a change region in which a ratio (C/(Si+C)) of the number of carbon atoms (C) with respect to the sum of the number of silicon atoms (Si) and the number of carbon atoms (C) gradually increases toward a surface side of the electrophotographic photosensitive member from a side of the photoconductive layer, the change region having an upper charge injection prohibiting portion containing a Group 13 atom, and a surface-side portion positioned closer to the surface side of the electrophotographic photosensitive member than the upper charge injection prohibiting portion and not containing the Group 13 atom, wherein when a precipitous property of the distribution of the Group 13 atom in the surface layer is defined as ΔZ, ΔZ satisfies a relationship represented by the following expression (A7),
1.0≦ΔZ/ΔZ0≦3.0 (A7), wherein ΔZ is determined as follows: (A1) obtaining a depth profile of the surface layer of the electrophotographic photosensitive member by an SIMS analysis; in the depth profile, defining an ionic strength of the Group 13 atom in the thickness direction of the surface layer as f(D), defining a maximal value of f(D) as f(DMAX), defining a second order differential of f(D) as f″(D), defining a distance from the surface of the electrophotographic photosensitive member to a first position at which the following relation is satisfied in the surface layer as DA; f″(D) changes from f″(D)=0 to f″(D)<0 defining a distance from the surface of the electrophotographic photosensitive member to a second position at which the following relation is satisfied in the surface layer as DB; f″(D) changes from f″(D)<0 to f″(D)=0 defining a distance from the surface of the electrophotographic photosensitive member to a third position which satisfies f((DA+DB)/2)≧f(DMAX)×0.5 as DS, wherein in case of existing plural positions satisfying the above condition in the thickness direction of the surface layer, the nearest position to the surface of the electrophotographic photosensitive member is chosen as the third position, defining the ionic strength f(D) at their position, as f(DS); and when f(DS) is defined as a standard ionic strength, defining a fourth position at which the ionic strength first reaches 16% with respect to the standard ionic strength, and defining a fifth position at which the ionic strength first reaches 84% with respect to the standard ionic strength, ΔZ is determined as a distance between the fourth position and the fifth position, and wherein the ΔZ0 is determined as follows: (A2) providing a standard laminated film A consisting of a film A1 that has a composition corresponding to the upper charge injection prohibiting portion and a film A2 that has a composition corresponding to the surface-side portion, stacked in this order; (A3) obtaining a depth profile of the surface layer of a standard laminated film A by an SIMS analysis in the depth profile, defining f(D), f(DMAX), DA, DB, DS and f(DS) of the standard laminated film A corresponding to those defined in (A1), defining a sixth position at which the ionic strength first reaches 16% with respect to the standard ionic strength of the standard laminated film A, and defining a seventh position at which the ionic strength first reaches 84% with respect to the standard ionic strength of the standard laminated film A, ΔZ0 is determined as a distance between the sixth position and the seventh position. |
