发明名称 Transport system for an extreme ultraviolet light source
摘要 A system for an extreme ultraviolet (EUV) light source includes a radical transport system that includes one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, where the second portion of at least one of the one or more conduits is positioned relative to a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector and the second portion; and a control system.
申请公布号 US9557650(B2) 申请公布日期 2017.01.31
申请号 US201514740916 申请日期 2015.06.16
申请人 ASML Netherlands B.V. 发明人 De Dea Silvia;Ershov Alexander I.;Verhoff Brandon;Wilson Gregory;La Fontaine Bruno M.
分类号 H05G2/00;G03F7/20 主分类号 H05G2/00
代理机构 DiBerardino McGovern IP Group LLC 代理人 DiBerardino McGovern IP Group LLC
主权项 1. A system for an extreme ultraviolet (EUV) light source, the system comprising: a radical transport system comprising: one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, whereinthe second portion of at least one of the one or more conduits is configured to be positioned relative to an outer perimeter of a reflective surface of a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector and the second portion; a mount configured to hold the collector, the mount comprising a wall and a lip extending from the wall, the lip being angled toward the reflective surface of the collector, the gap being between the lip and the outer perimeter of the reflective surface, and a control system comprising: one or more electronic processors;a non-transient computer-readable medium coupled to the one or more electronic processors, the computer-readable medium comprising instructions that, when executed, cause the one or more electronic processors to: control a flow of a gas through an aperture of the collector,control a flow of the gas through the gap between the second portion of the at least one of the one or more conduits and the collector, andcontrol a flow of free radicals through the one or more openings in the second portion of the one or more conduits.
地址 Veldhoven NL