发明名称 Semiconductor device, integrated circuit structure using the same, and manufacturing method thereof
摘要 A semiconductor device includes a substrate, a semiconductor structure, a metal pad, and a stress releasing material. The semiconductor structure is disposed on the substrate. The metal pad is disposed on the semiconductor structure. The metal pad includes a through hole therein. The stress releasing material is disposed in the through hole.
申请公布号 US9559069(B2) 申请公布日期 2017.01.31
申请号 US201514609023 申请日期 2015.01.29
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 Chen Yu-Feng;Chen Chen-Shien;Wu Sheng-Yu;Kuo Tin-Hao;Lin Yen-Liang
分类号 H01L23/48;H01L23/00 主分类号 H01L23/48
代理机构 Maschoff Brennan 代理人 Maschoff Brennan
主权项 1. A semiconductor device comprising: a substrate; a semiconductor structure disposed on the substrate; a metal pad disposed on the semiconductor structure, wherein the metal pad includes a through hole therein; a stress releasing material disposed in the through hole; a polymer layer disposed on the semiconductor structure and covering a portion of the metal pad and the stress releasing material, the polymer layer having a first opening to expose another portion of the metal pad; and a conductive layer present on a top surface of the polymer layer and electrically connected to the exposed portion of the metal pad through the first opening.
地址 Hsinchu TW