发明名称 |
Semiconductor device, integrated circuit structure using the same, and manufacturing method thereof |
摘要 |
A semiconductor device includes a substrate, a semiconductor structure, a metal pad, and a stress releasing material. The semiconductor structure is disposed on the substrate. The metal pad is disposed on the semiconductor structure. The metal pad includes a through hole therein. The stress releasing material is disposed in the through hole. |
申请公布号 |
US9559069(B2) |
申请公布日期 |
2017.01.31 |
申请号 |
US201514609023 |
申请日期 |
2015.01.29 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
Chen Yu-Feng;Chen Chen-Shien;Wu Sheng-Yu;Kuo Tin-Hao;Lin Yen-Liang |
分类号 |
H01L23/48;H01L23/00 |
主分类号 |
H01L23/48 |
代理机构 |
Maschoff Brennan |
代理人 |
Maschoff Brennan |
主权项 |
1. A semiconductor device comprising:
a substrate; a semiconductor structure disposed on the substrate; a metal pad disposed on the semiconductor structure, wherein the metal pad includes a through hole therein; a stress releasing material disposed in the through hole; a polymer layer disposed on the semiconductor structure and covering a portion of the metal pad and the stress releasing material, the polymer layer having a first opening to expose another portion of the metal pad; and a conductive layer present on a top surface of the polymer layer and electrically connected to the exposed portion of the metal pad through the first opening. |
地址 |
Hsinchu TW |