发明名称 Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
摘要 A liquid immersion exposure apparatus includes a projection system having a final element and a liquid immersion member that forms a liquid immersion space under the final element. The liquid immersion member includes a first member that surrounds the final element and that has a liquid supply port and a liquid suction port and a second member at least a portion of which is disposed below the first member, and that is movable with respect to the first member. The first member has a channel therein, one end of the channel is open to a first space between the final element and the first member, the other end of the channel is disposed below the one end and is open to a second space different from the first space, and the channel is provided such that liquid is allowed to flow into the channel.
申请公布号 US9557654(B2) 申请公布日期 2017.01.31
申请号 US201615015704 申请日期 2016.02.04
申请人 NIKON CORPORATION 发明人 Sato Shinji
分类号 G03B27/52;G03B27/42;G03F7/20 主分类号 G03B27/52
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A liquid immersion exposure apparatus comprising: a projection system having a final element; a liquid immersion member that forms a liquid immersion space under the final element, wherein: the liquid immersion member includes a first member that surrounds the final element and that has a liquid supply port and a liquid suction port; the liquid immersion member includes a second member, at least a portion of which is disposed below the first member, and that is movable with respect to the first member; the first member has a channel therein; one end of the channel is open to a first space between the projection system and the liquid immersion member; an other end of the channel is disposed below the one end and is open to a second space different from the first space; and the channel is provided such that liquid is allowed to flow into the channel.
地址 Tokyo JP