发明名称 |
Solid-state imaging apparatus and electronic apparatus |
摘要 |
A solid-state imaging apparatus includes a phase difference detection pixel including a photoelectric conversion section that is formed on a semiconductor substrate and configured to photoelectrically convert incident light, a waveguide configured to guide the incident light to the photoelectric conversion section, and a light-shielding section that is formed in vicinity of an opening of the waveguide and configured to shield a part of the incident light that enters the waveguide. |
申请公布号 |
US9559226(B2) |
申请公布日期 |
2017.01.31 |
申请号 |
US201414313644 |
申请日期 |
2014.06.24 |
申请人 |
Sony Corporation |
发明人 |
Akiyama Kentaro |
分类号 |
H01L31/0232;H01L31/0216;G02B6/42;H01L27/146 |
主分类号 |
H01L31/0232 |
代理机构 |
Michael Best & Friedrich LLP |
代理人 |
Michael Best & Friedrich LLP |
主权项 |
1. A solid-state imaging apparatus comprising: an on-chip lens that receives incident light, a first portion of the incident light and a second portion of the incident light are transmitted through the on-chip lens; a waveguide that guides the first portion of the incident light onto a photoelectric conversion section of a semiconductor substrate, the waveguide is between the semiconductor substrate and the on-chip lens; a light-shielding section that prevents the second portion of the incident light from reaching the waveguide, a portion of the light-shielding section is between the waveguide and the on-chip lens; a different waveguide that guides the incident light onto a different photoelectric conversion section of the semiconductor substrate, the different waveguide is between the semiconductor substrate and a different on-chip lens, wherein no light-shielding section is between the different waveguide and the different on-chip lens and wherein no light-shielding section is between the different waveguide and the different on-chip lens and wherein the different photoelectric conversion section is adjacent to the photoelectric conversion section. |
地址 |
Tokyo JP |