发明名称 Deposition system with electrically isolated pallet and anode assemblies
摘要 A system for substrate deposition is disclosed. The system includes a wafer pallet and an anode. The wafer pallet has a bottom and a top. The top of the wafer pallet is configured to hold a substrate wafer. The anode has a substantially fixed position relative to the wafer pallet and is configured to move with the wafer pallet through the deposition chamber. The anode is electrically isolated from the substrate wafer.
申请公布号 US9556512(B2) 申请公布日期 2017.01.31
申请号 US201314023211 申请日期 2013.09.10
申请人 SunPower Corporation 发明人 Cousins Peter John;Luan Hsin-Chiao;Pass Thomas;Ferrer John;Gallardo Rex;Meyer Stephen F.
分类号 C23C14/34;C23C14/50;C23C16/458;H01L21/677;H01L21/687;H01J37/32;H01J37/34 主分类号 C23C14/34
代理机构 Blakely Sokoloff Taylor Zafman LLP 代理人 Blakely Sokoloff Taylor Zafman LLP
主权项 1. A method for depositing a material, comprising: placing a substrate wafer on a top of a wafer pallet; coupling the wafer pallet to a transport carrier and an anode, inserting an insulator between the wafer pallet and the transport carrier, wherein the transport carrier is electrically coupled to the anode, inserting an anode post of the anode through an anode opening in the wafer pallet, connecting a wire to the anode post, wherein the wire runs approximately across the top of the wafer pallet, wherein the substrate wafer is electrically isolated from the anode; moving the substrate wafer, wafer pallet, transport carrier, and anode together through a deposition chamber; and depositing a deposition material on the substrate wafer.
地址 San Jose CA US
您可能感兴趣的专利