发明名称 TARGET FOR THE REACTIVE SPUTTER DEPOSITION OF ELECTRICALLY INSULATING LAYERS
摘要 A target whose target surface is embodied so that the use of the target for reactive sputter deposition of electrically insulating layers in a coating chamber avoids a production of a spark discharge from the target surface to an anode that is situated in the coating chamber.
申请公布号 HK1217976(A1) 申请公布日期 2017.01.27
申请号 HK20160105957 申请日期 2016.05.25
申请人 OERLIKON SURFACE SOLUTIONS AG TRBBACH 发明人 HAGMANN, Juerg;KRASSNITZER, Siegfried
分类号 C23C;H01J 主分类号 C23C
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