A chemical-mechanical polishing concentrate includes at least 10 weight percent of a colloidal silica abrasive particle dispersed in a liquid carrier having a pH in a range from about 1.5 to about 7. The colloidal silica abrasive includes an aminosilane compound or a phosphonium silane compound incorporated therein. The concentrate may be diluted with at least 3 parts water per one part concentrate prior to use.
申请公布号
SG11201610331R(A)
申请公布日期
2017.01.27
申请号
SG11201610331R
申请日期
2015.06.25
申请人
CABOT MICROELECTRONICS CORPORATION
发明人
GRUMBINE, STEVEN;DYSARD, JEFFREY;SHEN, ERNEST;CAVANAUGH, MARY