发明名称 |
CONTROL OF P-CONTACT RESISTANCE IN A SEMICONDUCTOR LIGHT EMITTING DEVICE |
摘要 |
A device according to embodiments of the invention includes a semiconductor structure including a light emitting layer disposed between an n-type region and a p-type region. A surface of the p-type region perpendicular to a growth direction of the semiconductor structure includes a first portion and a second portion. The first portion is less conductive than the second portion. The device further includes a p-contact formed on the p-type region. The p-contact includes a reflector and a blocking material. The blocking material is disposed over the first portion and no blocking material is disposed over the second portion. |
申请公布号 |
US2017025576(A1) |
申请公布日期 |
2017.01.26 |
申请号 |
US201615289548 |
申请日期 |
2016.10.10 |
申请人 |
KONINKLIJKE PHILIPS N.V. |
发明人 |
Choy Kwong-Hin Henry |
分类号 |
H01L33/24;H01L33/40;H01L33/30 |
主分类号 |
H01L33/24 |
代理机构 |
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代理人 |
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主权项 |
1. A method comprising:
partially activating the p-type region in a III-nitride structure comprising a light emitting layer disposed between an n-type region and a p-type region; after partially activating the p-type region, forming a metal p-contact on the p-type region, the metal p-contact comprising:
a first metal, wherein the first metal is reflective; anda second metal; and after forming the metal p-contact, further activating the p-type region. |
地址 |
Eindhoven NL |