| 发明名称 |
LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD |
| 摘要 |
Provided is a lithography apparatus that performs a patterning on a substrate. The lithography apparatus includes a processor configured to perform processing of assigning, to each of a plurality of substrates sequentially carried in from a first external apparatus, order information indicating an carrying-in order of the plurality of substrates; a plurality of units configured to respectively perform patternings of the plurality of substrates in parallel; and a transmitting device configured to transmit, to a second external apparatus, the order information corresponding to a substrate, of the plurality of substrates, carried out after being patterned thereon by one of the plurality of units. |
| 申请公布号 |
US2017025292(A1) |
申请公布日期 |
2017.01.26 |
| 申请号 |
US201515302349 |
申请日期 |
2015.02.27 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Kotoku Masashi;Haginiwa Kuniyasu |
| 分类号 |
H01L21/67 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithography apparatus that performs a patterning on a substrate, the apparatus comprising:
a processor configured to perform processing of assigning, to each of a plurality of substrates sequentially carried in from a first external apparatus, order information indicating an carrying-in order of the plurality of substrates; a plurality of units configured to respectively perform patternings of the plurality of substrates in parallel; and a transmitting device configured to transmit, to a second external apparatus, the order information corresponding to a substrate, of the plurality of substrates, carried out after being patterned thereon by one of the plurality of units. |
| 地址 |
Tokyo JP |
