| 发明名称 |
TWO-DIMENSIONAL MATERIAL HARD MASK, METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING MATERIAL LAYER PATTERN USING THE HARD MASK |
| 摘要 |
A 2D material hard mask includes hydrogen, oxygen, and a 2D material layer having a layered crystalline structure. The 2D material layer may be a material layer including one of a carbon structure (for example, a graphene sheet) and a non-carbon structure. |
| 申请公布号 |
US2017025273(A1) |
申请公布日期 |
2017.01.26 |
| 申请号 |
US201514984189 |
申请日期 |
2015.12.30 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
SHIN Keunwook;SEOL Minsu;SHIN Hyeonjin;KIM Sangwon;PARK Seongjun |
| 分类号 |
H01L21/033;H01L21/027;H01L21/311;H01L21/3215;H01L21/02 |
主分类号 |
H01L21/033 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A hard mask comprising hydrogen, oxygen and a two-dimensional (2D) material layer having a layered crystalline structure. |
| 地址 |
Suwon-si KR |
