发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM |
摘要 |
A method of manufacturing a semiconductor device includes: providing a substrate having an oxide film; performing, a predetermined number of times, a cycle of non-simultaneously performing supplying a precursor gas to the substrate, supplying a carbon-containing gas to the substrate, and supplying a nitrogen-containing gas to the substrate, or performing, a predetermined number of times, a cycle of non-simultaneously performing supplying a precursor gas to the substrate and supplying a gas containing carbon and nitrogen to the substrate, or performing, a predetermined number of times, a cycle of non-simultaneously performing supplying a precursor gas containing carbon to the substrate and supplying a nitrogen-containing gas to the substrate, the oxide film being used as an oxygen source to form a nitride layer containing oxygen and carbon as a seed layer; and forming a nitride film containing no oxygen and carbon as a first film on the seed layer. |
申请公布号 |
US2017025271(A1) |
申请公布日期 |
2017.01.26 |
申请号 |
US201615216956 |
申请日期 |
2016.07.22 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC. |
发明人 |
HASHIMOTO Yoshitomo;HIROSE Yoshiro;NOHARA Shingo;SASAJIMA Ryota;HARADA Katsuyoshi;URANO Yuji |
分类号 |
H01L21/02;C23C16/52;C23C16/50;C23C16/455 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method of manufacturing a semiconductor device, comprising:
providing a substrate having an oxide film formed on a surface of the substrate; performing, a predetermined number of times, a cycle of non-simultaneously performing a process of supplying a precursor gas to the substrate, a process of supplying a carbon-containing gas to the substrate, and a process of supplying a nitrogen-containing gas to the substrate, or performing, a predetermined number of times, a cycle of non-simultaneously performing a process of supplying a precursor gas to the substrate and a process of supplying a gas containing carbon and nitrogen to the substrate, or performing, a predetermined number of times, a cycle of non-simultaneously performing a process of supplying a precursor gas containing carbon to the substrate and a process of supplying a nitrogen-containing gas to the substrate, the oxide film being used as an oxygen source to form a nitride layer containing oxygen and carbon as a seed layer on the oxide film; and forming a nitride film containing no oxygen and carbon as a first film on the seed layer. |
地址 |
Tokyo JP |